SE-P(1-5)
SE-P(1-5) Laser Scribing Machine
Suitable for laser scribing of transparent conductive films (SnO2, AZO, ITO), amorphous silicon film systems (a-Si, μc-Si), back electrode films (ZnO, AI), and other thin-film solar cell materials, including calcium titanium thin films, metal molybdenum (Mo) thin films, metal nickel (Ni) thin films, and cadmium telluride (CdTe) thin films.
Product Display
Product Advantages
- Suitable laser configurations based on different usage scenarios and process requirements.
- Non-contact air-floating working platform with automatic material loading and unloading.
- Two-dimensional separation linear motion platform, with the film side of the solar cell panel facing upward during movement.
- CCD automatic recognition and positioning system to ensure precise scribing (clean edge) effects.
- Unique dust collection system to maintain a clean working environment.
Technical Parameters
SE-P(1-5)
Effective Processing Area: 1400mm x 1000mm (customizable according to requirements)
Maximum Operating Speed: 2000mm/s (P1/P2/P3/P5), 200mm/s (P4)
±10μm/1000mm
±10μm/1000mm
30~60μm
5~20mm
300~500μm